Huawei is developing a true 5 nm production line without the need for EUV lithography machines. Furthermore, 3 nm chips are already in the R&D stage, with plans to start production by 2026, according to a report by UDN.
Huawei cannot use standard EUV technology, as it is patented by the Dutch company ASML, which is banned from working with the Chinese manufacturer. Instead, the company is using SSA800 lithography machines with multi-patterning, made by Shanghai Micro Electronics (SMEE).
Research and development for 3nm chips are following two approaches: one is GAA architecture (the…
Huawei is developing a true 5 nm production line without the need for EUV lithography machines. Furthermore, 3 nm chips are already in the R&D stage, with plans to start production by 2026, according to a report by UDN.
Huawei cannot use standard EUV technology, as it is patented by the Dutch company ASML, which is banned from working with the Chinese manufacturer. Instead, the company is using SSA800 lithography machines with multi-patterning, made by Shanghai Micro Electronics (SMEE).
Research and development for 3nm chips are following two approaches: one is GAA architecture (the… Read More GSMArena.com – Latest articles
